Effects of annealing and pulse plating on soft magnetic properties of electroplated Fe-Ni films
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چکیده
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architecture and engineering of nanoscale sculptured thin films and determination of their properties
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15 صفحه اولEffects of Process Conditions on Properties of Electroplated Ni Thin Films for Microsystem Applications
Effects of Process Conditions on Properties of Electroplated Ni Thin Films for Microsystem Applications J. K. Luo, M. Pritschow, A. J. Flewitt, S. M. Spearing,* N. A. Fleck, and W. I. Milne Department of Engineering, University of Cambridge, Cambridge CB3 0FA, United Kingdom Institute for Microelectronics Stuttgart, 70569 Stuttgart, Germany School of Engineering Science, University of Southampt...
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Soft magnetic properties of Fe-Co-Ni-Al-Cr-Si thin films were studied. As-deposited Fe-Co-Ni-Al-Cr-Si nano-grained thin films showing no magnetic anisotropy were subjected to field-annealing at different temperatures to induce magnetic anisotropy. Optimized magnetic and electrical properties of Fe-Co-Ni-Al-Cr-Si films annealed at 200 ◦C are saturation magnetization 9.13 × 105 A/m, coercivity 79...
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Co-Fe films were electrodeposited on Cu substrate from electrolytes with different Co concentration levels. X-ray diffraction (XRD) was used to investigate the films crystal structures. The results indicate that if the Co concentration is less that the Fe concentration, the cubic structure appears in the films, while the hexagonal structure dominates when the C...
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ژورنال
عنوان ژورنال: AIP Advances
سال: 2016
ISSN: 2158-3226
DOI: 10.1063/1.4944076